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titanium nitride structure

titanium nitride structure

Titanium nitride TiN - PubChem

Titanium nitride sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis) Titanium nitride sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) 3 Chemical and Physical Properties 3.1 Computed Properties

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Titanium Nitride - an overview ScienceDirect Topics

Titanium nitride (TiN) shows a cubic structure of the NaCl type. Thin films of TiN are prepared by sputtering from a TiN powder target in Ar. Table 6.38 shows typical sputtering conditions for deposition of TiN thin films. These sputtered films show a crystalline structure even at a low substrate temperature.

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mp-492: TiN (cubic, Fm-3m, 225) - Materials Project

TiN is Halite, Rock Salt structured and crystallizes in the cubic Fm-3m space group. The structure is three-dimensional. Ti3+ is bonded to six equivalent N3- atoms to form a mixture of edge and corner-sharing TiN6 octahedra. The corner-sharing octahedral tilt

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mp-8282: Ti2N (tetragonal, P4_2/mnm, 136)

Ti2N is Rutile structured and crystallizes in the tetragonal P4_2/mnm space group. The structure is three-dimensional. Ti is bonded in a distorted T-shaped geometry to three equivalent N atoms. All Ti–N bond lengths are 2.08 Å. N is bonded to six equivalent Ti atoms

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Continuous 3D Titanium Nitride Nanoshell Structure

2019-5-17  Here, continuously 3D-structured, electrically conductive titanium nitride nanoshells (3D TiN) for biocatalytic CO 2-to-formate conversion in a bias-free tandem PEC system are reported. The 3D TiN exhibits a periodically porous network with high porosity (92.1%) and conductivity (6.72 × 10 4 S m −1 ), which allows for high enzyme loading and direct electron transfer (DET) to the immobilized enzyme.

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Investigation of Electronic Structures of Titanium

The electronic structure of titanium nitride layers formed on the TiNi substrates is examined by Auger electron spectroscopy and electron emission distribution methods. Spectral analysis shows that the on-top carbon layer has a graphite structure and the neighbouring layer is constituted of titanium nitride.

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Structure and Electrical Properties of Titanium Nitride ...

1978-1-1  X-ray analysis revealed that the films were composed of α-titanium, distorted titanium phase, amorphous phase, and TiN. The distorted titanium phase was found to extend to a high concentration of nitrogen ( x =0.5). In particular, the specimens evaporated at pN =2.0 × 10 -5 Torr and Ts =500°C had maximum resistivity of 270 µΩ-cm and a very ...

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Continuous 3D Titanium Nitride Nanoshell Structure

2019-5-17  Continuous 3D Titanium Nitride Nanoshell Structure for Solar‐Driven Unbiased Biocatalytic CO 2 Reduction Su Keun Kuk. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 335 Science Road, Daejeon, 305‐701 Republic of Korea.

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PHYSICAL PROPERTIES OF TITANIUM NITRIDE THIN FILM

2013-2-6  The titanium nitride thin film is deposited on p-type silicon (100) substrates by reactive DC magnetron sputtering technique. This system is consisted of planer Ti metal (99.99 % pure) with 5 cm diameter. The distance between wafer and target was 3 cm. The growth chamber is initially evacuated up to a pressure of 1×10-5 mbar by a rotary pump (ALCATEL) and defusing pumps. Then Gas mixture of

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Structure and mechanical properties of titanium

Corpus ID: 16931532. Structure and mechanical properties of titanium nitride thin films grown by reactive pulsed laser deposition @inproceedings{Kim2009StructureAM, title={Structure and mechanical properties of titanium nitride thin films grown by reactive pulsed laser deposition}, author={S. Kim and Hoon Park and K. Lee and S. H. Jee and D. Kim and Y. Yoon and H. B. Chae}, year={2009} }

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Continuous 3D Titanium Nitride Nanoshell Structure

2019-5-17  Continuous 3D Titanium Nitride Nanoshell Structure for Solar‐Driven Unbiased Biocatalytic CO 2 Reduction Su Keun Kuk. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 335 Science Road, Daejeon, 305‐701 Republic of Korea.

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Investigation of Electronic Structures of Titanium

The electronic structure of titanium nitride layers formed on the TiNi substrates is examined by Auger electron spectroscopy and electron emission distribution methods. Spectral analysis shows that the on-top carbon layer has a graphite structure and the neighbouring layer is constituted of titanium nitride. The shape of the main valence spectra was explained by the Hubbard model.

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Structure and Electrical Properties of Titanium Nitride ...

Metallic titanium, in nitrogen atmosphere with specified pressures (pN) ranging from 10-6 to 10-4 Torr, was evaporated on glass substrates heated at temperatures (Ts) between 300 to 500°C. X-ray analysis revealed that the films were composed of α-titanium, distorted titanium phase, amorphous phase, and TiN. The distorted titanium

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Ab Initio Study of the Atomic Level Structure of the ...

2017-9-22  Titanium nitride (TiN) is widely used in industry as a protective coating due to its hardness and resistance to corrosion and can spontaneously form a thin oxide layer when it is exposed to air, which could modify the properties of the coating. With limited understanding of the TiO2–TiN interfacial system at present, this work aims to describe the structural and electronic properties of ...

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Phys. Rev. B 79, 235126 (2009) - Titanium nitride: A ...

2009-6-19  We investigate electron correlation effects in stoichiometric titanium nitride (TiN) using a combination of electronic structure and many-body calculations. In a first step, the N th-order muffin-tin-orbital technique is used to obtain parameters for the low

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氮化钛_百度百科

氮化钛(Titanium nitride),是一种化合物,分子式是TiN,分子量为61.88,TiN粉末一般呈黄褐色,超细TiN粉末呈黑色,而TiN晶体呈金黄色。TiN熔点为2950℃,莫氏硬度8-9,抗热冲击性好。TiN熔点比大多数过渡金属氮化物的熔点高,而密度却比大多数金属氮化物

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Semiconducting cubic titanium nitride in the

2018-1-22  Semiconducting cubic titanium nitride in the Th 3 P 4 structure Venkata S. Bhadram, Hanyu Liu, Enshi Xu, Tianshu Li, Vitali B. Prakapenka, Rostislav Hrubiak, Stephan Lany, and Timothy A. Strobel Phys. Rev. Materials 2, 011602(R) – Published 22 January 2018

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Electronic and optical properties of titanium nitride

2015-11-18  In this work, we report calculations for titanium nitride (TiN), a promising material for plasmonic applications because of less loss and other practical advantages compared to noble metals. We investigated structural, electronic, and optical properties of stoichiometric bulk TiN, as well as of the TiN(100), TiN(110), and TiN(111) outermost ...

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Facile Preparation of Mesoporous Titanium Nitride ...

2021-3-12  In this study, mesoporous TiN spheres with tunable diameter have been fabricated via a facile template-free strategy. Under ammonia atmosphere, mesoporous TiO2 spheres are directly converted into mesoporous TiN spheres with the addition of cyanamide to retain the original morphology. The electrochemical performance of the resultant mesoporous TiN spheres demonstrates that this

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Structure and Electrical Properties of Titanium Nitride ...

1978-1-1  Metallic titanium, in nitrogen atmosphere with specified pressures (p N) ranging from 10-6 to 10-4 Torr, was evaporated on glass substrates heated at temperatures (T s) between 300 to 500°C.X-ray analysis revealed that the films were composed of α-titanium, distorted titanium

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Description of the structure and performance of

2021-3-29  Titanium nitride is a non-stoichiometric compound, and its stable composition range is TiN0.6~TiN1.16, and the nitrogen content can be changed within a certain range without causing changes in the TiN structure. Titanium nitride powder is generally yellowish-brown, ultrafine titanium nitride powder is black, and titanium nitride crystals are ...

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Structure and mechanical properties of titanium

Corpus ID: 16931532. Structure and mechanical properties of titanium nitride thin films grown by reactive pulsed laser deposition @inproceedings{Kim2009StructureAM, title={Structure and mechanical properties of titanium nitride thin films grown by reactive pulsed laser deposition}, author={S. Kim and Hoon Park and K. Lee and S. H. Jee and D. Kim and Y. Yoon and H. B. Chae}, year={2009} }

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99.5% TiN,Titanium nitride TiN powder CAS 25583-20

2021-4-12  The structure and properties of titanium nitride. TiN has a typical NaCl-type structure and belongs to a face-centered cubic lattice. The top of the face-centered cube is the nitrogen atom, and the titanium atom is located at the (1/2,0,0) spatial position of the face-centered cube. TiN is a non-stoichiometric compound, and its stable ...

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Structure of Titanium Nitride Coatings on Stainless Steel

2014-2-26  Structure of Titanium Nitride Coatings on Stainless Steel 304 Pichet Limsuwan1, Nitinai Udomkan1 and Pongtip Winotai 2 ABSTRACT The microstructure of TiN films deposited by magnetron sputtering are related to their properties and deposition conditions. The transition from porous to compact films and the change in their

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Investigation of Electronic Structures of Titanium

The electronic structure of titanium nitride layers formed on the TiNi substrates is examined by Auger electron spectroscopy and electron emission distribution methods. Spectral analysis shows that the on-top carbon layer has a graphite structure and the neighbouring layer is constituted of titanium nitride. The shape of the main valence spectra was explained by the Hubbard model.

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Crystal structure and mechanical properties of

2017-10-13  The effect of nitrogen consumption and the discharge current density on the crystal structure of titanium nitride films synthesized by the method of reactive magnetron sputtering of a hot target at a constant current is studied by X-ray phase analysis. It is found that the phase of titanium nitride of a cubic crystal system is formed in the films. An increase in the current density leads to ...

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The effect of surface chemistry and structure of

The effect of surface chemistry and structure of titanium nitride (TiN) films on primary hippocampal cells. Cyster LA(1), Grant DM, Parker KG, Parker TL. Author information: (1)Biomaterials Group, School of MMMEM, University of Nottingham, Nottingham, NG7 2RD, UK. [email protected]

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Phys. Rev. B 79, 235126 (2009) - Titanium nitride: A ...

2009-6-19  We investigate electron correlation effects in stoichiometric titanium nitride (TiN) using a combination of electronic structure and many-body calculations. In a first step, the N th-order muffin-tin-orbital technique is used to obtain parameters for the low

Get Price

Effect of the substrate on structure and properties of ...

2019-9-26  The authors deposited titanium nitride (TiN) films by plasma-enhanced atomic layer deposition on various types of amorphous, polycrystalline, and single crystalline substrates and found that the crystallinity of the substrate strongly affects

Get Price

Structure and Electrical Properties of Titanium Nitride ...

1978-1-1  Metallic titanium, in nitrogen atmosphere with specified pressures (p N) ranging from 10-6 to 10-4 Torr, was evaporated on glass substrates heated at temperatures (T s) between 300 to 500°C.X-ray analysis revealed that the films were composed of α-titanium, distorted titanium

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Local structure of titanium nitride-based coatings ...

The fine structure of X-ray absorption spectra near the K edge and the extended fine structure of X-ray absorption for titanium, copper, and chromium in nanocrystalline coatings based on titanium nitride doped with copper, chromium, and silicon are experimentally studied.

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Structure of Titanium Nitride Coatings on Stainless Steel

2014-2-26  Structure of Titanium Nitride Coatings on Stainless Steel 304 Pichet Limsuwan1, Nitinai Udomkan1 and Pongtip Winotai 2 ABSTRACT The microstructure of TiN films deposited by magnetron sputtering are related to their properties and deposition conditions. The transition from porous to compact films and the change in their

Get Price

99.5% TiN,Titanium nitride TiN powder CAS 25583-20

2021-4-12  The structure and properties of titanium nitride. TiN has a typical NaCl-type structure and belongs to a face-centered cubic lattice. The top of the face-centered cube is the nitrogen atom, and the titanium atom is located at the (1/2,0,0) spatial position of the face-centered cube. TiN is a non-stoichiometric compound, and its stable ...

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Titanium nitride – Properties and Applications

Titanium nitride (TiN) has a typical NaCl-type structure, which belongs to a face-centered cubic lattice with a lattice constant a=0.4241 nm, in which titanium atoms are located at the corner tops of the face-centered cubic.TiN is a non-stoichiometric compound, and its stable composition range is TiN0.37-TiN1.16. The nitrogen content can be changed within a certain range without causing ...

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Structure Characteristic of Titanium Nitride Nanowires

Acta Phys. -Chim. Sin. ›› 2017, Vol. 33 ›› Issue (6): 1181-1188. doi: 10.3866/PKU.WHXB201703151 • ARTICLE • Previous Articles Next Articles Structure Characteristic of Titanium Nitride Nanowires and Its Electrode Processes for Ⅴ(Ⅱ)/Ⅴ(Ⅲ) Redox Couple

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Structure and properties of titanium nitride

Abstract. This investigation examines the structure and properties of titanium nitride strengthened microlaminate metal matrix composites. Reactive ion plated titanium nitride (TiN) was deposited onto titanium, nickel, and aluminum foils which were subsequently hot

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The effect of surface chemistry and structure of

The effect of surface chemistry and structure of titanium nitride (TiN) films on primary hippocampal cells. Cyster LA(1), Grant DM, Parker KG, Parker TL. Author information: (1)Biomaterials Group, School of MMMEM, University of Nottingham, Nottingham, NG7 2RD, UK. [email protected]

Get Price

Phys. Rev. B 79, 235126 (2009) - Titanium nitride: A ...

2009-6-19  We investigate electron correlation effects in stoichiometric titanium nitride (TiN) using a combination of electronic structure and many-body calculations. In a first step, the N th-order muffin-tin-orbital technique is used to obtain parameters for the low

Get Price

Effect of the substrate on structure and properties of ...

2019-9-26  The authors deposited titanium nitride (TiN) films by plasma-enhanced atomic layer deposition on various types of amorphous, polycrystalline, and single crystalline substrates and found that the crystallinity of the substrate strongly affects

Get Price